Poland – Machines and apparatus for testing and measuring – DELIVERY OF EQUIPMENT FOR THE EFFICIENT PRODUCTION OF NANOPHOTONIC SEMICONDUCTOR STRUCTURES WITH LARGE AREAS BY ELECTRONOLITHOGRAPHY
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Contract Description
1. The subject of the order is the "Supply of equipment for the efficient production of nanophotonic semiconductor structures with large surfaces using the electron beam lithography method" - hereinafter referred to as EBL (Electron Beam Lithography), together with all the necessary subsystems and components related to the potential need to adapt the EBL system to the existing WTC WAT laboratory base in laboratory no. 025c located in building 24 in the closed area of WAT, aimed at correct and stable operation over time at operating parameters declared by the manufacturer, including transport services,